Step-and-repeat exposure method

Details Step-and-repeat exposure method Step-and-repeat exposure method

1988-02-10

1988-12-20

Westin, Edward P.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356401, G01B 1127

Patent

active

047926937

ABSTRACT:
In a step-and-repeat exposure method, an alignment error does not influence accuracy of a shot arrangement on a photosensitive substrate. An amount corresponding to an alignment error of a reticle with respect to the apparatus is detected, a position as an origin of an x-y stage for moving a photosensitive substrate is corrected by the detected amount, and a step-and-repeat exposure is then performed using the reticle.

REFERENCES:
patent: 4395117 (1983-07-01), Suzuki
patent: 4636626 (1987-01-01), Hazama et al.
patent: 4662753 (1987-05-01), Yabu
patent: 4677301 (1987-06-01), Tanimoto et al.

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