Step and repeat exposure apparatus having improved system for al

Details Step and repeat exposure apparatus having improved system for al Step and repeat exposure apparatus having improved system for al

1987-07-02

1989-04-18

Fields, Carolyn E.

Radiant energy

Means to align or position an object relative to a source or...

2504922, 250548, 356400, G01J 100

Patent

active

048230120

ABSTRACT:
An alignment and exposure apparatus for aligning and exposing, in sequence, different shot areas of a semiconductor wafer with and to a pattern formed on a reticle is disclosed. The apparatus includes an alignment system having at least one objective optical system for detecting, at the same time, alignment marks provided in association with neighboring shot areas of the wafer which are to be exposed to the reticle pattern in sequence. Thus, with a simple structure and without the necessity of excessive movement of the wafer, signals providing sufficient positional information necessary for aligning each shot area with the reticle pattern are obtainable. This assures improved throughput and improved alignment accuracy.

REFERENCES:
patent: 4423959 (1982-01-01), Nakazawa et al.
patent: 4677301 (1987-06-01), Tanimoto et al.
patent: 4712016 (1987-12-01), Matsumura

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