Stencil mask with channels including depressions

Details Stencil mask with channels including depressions Stencil mask with channels including depressions

1999-07-22

2000-08-01

Hilten, John S.

Printing

Stenciling

Stencils

1011284, B05C 1706, B41N 124

Patent

active

060950412

ABSTRACT:
The positioning of mesh side features in a stencil mask are controlled to produce a mask which possesses high structural integrity and which exhibits a low service life. Mesh side feature control also eliminates certain unnecessary design side channels and mesh side via openings. Mesh side feature placement at T-shaped design side junctions is also controlled to produce a more uniform distribution of material which is screened through the stencil mask.

REFERENCES:
patent: 4803110 (1989-02-01), Ahn et al.
patent: 4811237 (1989-03-01), Putatunda et al.
patent: 5669970 (1997-09-01), Balog et al.
patent: 5819652 (1998-10-01), Utter et al.
Fugardi; Improved Silk Screen Mask; IBM Technical Disclosure Bulletin, vol. 6, No. 11, pp. 52-53, Apr. 1964.
Technical Disclosure Bulletin, vol. 32, No. 6A, Nov. 1989, One-Piece Screening Mask with Selectively Located Multiple-Size Mesh Holes and Open Stencils.

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