Stencil mask and charged particle beam exposure method and appar

Details Stencil mask and charged particle beam exposure method and appar Stencil mask and charged particle beam exposure method and appar

1991-06-20

1994-02-22

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

2504922, G03F 900, H01J 3704

Patent

active

052885674

ABSTRACT:
A stencil mask is used for exposing a pattern on a wafer using a charged particle beam which is transmitted through the stencil mask. The stencil mask is made up of a plate, and at least a block pattern region formed on the plate. The block pattern region includes apertures of arbitrary shapes for transmitting the charged particle beam which irradiates the apertures within the block pattern region in one shot of the charged particle beam. The block pattern region forms a block mask in which a pair of confronting blanking electrodes is provided with respect to at least predetermined ones of the apertures.

REFERENCES:
patent: 5036209 (1991-07-01), Kataoka et al.
patent: 5099133 (1992-03-01), Yamada

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