Stencil mask

Details Stencil mask Stencil mask

1995-01-24

1996-10-29

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430308, 430313, 430314, 430315, 219 6917, 219 692, 216 51, G03F 900

Patent

active

055695698

ABSTRACT:
A stencil mask for use in a photochemical reaction process includes a path extending between the rear and front surfaces thereof. The path is used with a window for passing photons so as to supply a reactive medium and discharge an exhaust medium containing reaction products. Further, the path also serves as a space for separating an object from a pattern on a mask substrate. The path has a depth which is smaller than a minimum value attained by a semiconductor manufacturing process.

REFERENCES:
patent: 5401932 (1995-03-01), Hashimoto et al.
N. Atoda, et al., "Diffraction effects on pattern replication with snychrotron radiation", J. Vac. Sci. Technol. B1 (4), Oct.-Dec. 1983, pp. 1267-1270.
Semicon News, VLSI Process, Jan. 1988.: pp. 31-38.
Masataka Hirose, "Plasma and Photo-excited Processes", Oct. 9, 1984, pp. 45-54/.

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