Stationary x-ray target and methods for manufacturing same

Details Stationary x-ray target and methods for manufacturing same Stationary x-ray target and methods for manufacturing same

2008-08-14

2011-10-11

Ho, Allen C. (Department: 2882)

X-ray or gamma ray systems or devices

Source

Target

Reexamination Certificate

active

08036341

ABSTRACT:
Stationary x-ray target assemblies manufactured using a metal deposition process to form one or more metal layers of the target. In particular, the metal deposition process is used to form an x-ray target metal layer and/or a stress buffer zone on an x-ray target substrate. The stress buffer zone improves material properties of the metals and/or the bonding between the x-ray target metal layer and the substrate. Improved bonding between the x-ray target metal layer and the substrate also improves the heat dissipation properties of the stationary x-ray target assembly.

REFERENCES:
patent: 4461020 (1984-07-01), Hubner et al.
patent: 5976339 (1999-11-01), Andre, Sr.
patent: 2005/0022560 (2005-02-01), Rowe et al.

Affiliated with

Also associated with

Rating

Stationary x-ray target and methods for manufacturing same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Stationary x-ray target and methods for manufacturing same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stationary x-ray target and methods for manufacturing same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4270965