Stationary magnetron sputtering cathode for a vacuum coating app

Details Stationary magnetron sputtering cathode for a vacuum coating app Stationary magnetron sputtering cathode for a vacuum coating app

1991-02-28

1993-01-26

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429819, 20429828, C23C 1435

Patent

active

051820030

ABSTRACT:
A stationary magnetron sputtering cathode for vacuum coating systems for substrates 17 passing in front of the cathode 10 on a circular path K and disposed on a substrate holder 4 has a circular disk-like yoke plate 15, and a first group or row of magnets 14b, 14b'. . . , essentially forming a closed circular ring, is provided in the marginal zone of the yoke plate 15 and a second group or row of magnets 14a, 14a'. . . , forming a random but essentially symmetric configuration, is provided in the center of the yoke plate 15. The segment of the magnetic tunnel located in the half (III+IV) of the yoke plate 15 which faces away from the rotating shaft 5 of the substrate holder 4 has a greater total length than the tunnel segment provided on the half (I+II) of yoke plate 15 facing toward the rotating shaft 5.

REFERENCES:
patent: 4312731 (1982-01-01), Morrison
patent: 4437966 (1984-03-01), Hope et al.
patent: 4746417 (1988-05-01), Ferenbach et al.
VEB Hochvakuum, "Vakuum Information", Oct. 31, 1983, p. 444.

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