Station and process for dispensing a reduced-pressure gas

Refrigeration – Cryogenic treatment of gas or gas mixture – Liquefaction

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

62614, 62616, F25J 100

Patent

active

061384739

ABSTRACT:
A station for dispensing a gas, in particular nitrogen, under a dispensing pressure, includes a line (10) for gas inlet under an inlet high pressure, a line (14) for dispensing the gas under a lower dispensing pressure, and a device (16) for reducing the pressure of the gas to be dispensed from the inlet pressure to the dispensing pressure. The pressure-reducing device (16) includes a machine for pressure reduction with external work production. The station includes upstream of the pressure-reducing device (16), a conduit (18) for dividing the inlet gas into a fraction to be dispensed and a complementary fraction, downstream of the conduit (18), a device (20) for liquefaction of the complementary fraction of the inlet gas that includes a heat exchanger (26) for exchanging heat with the reduced-pressure fraction of the inlet gas, and a reservoir (40) for collecting the liquefied complementary fraction.

REFERENCES:
patent: 2873180 (1959-02-01), Gilbert
patent: 3383873 (1968-05-01), Becker
patent: 3608323 (1971-09-01), Salama
patent: 3990256 (1976-11-01), May et al.
patent: 5799505 (1998-09-01), Bonaquist et al.
patent: 5836173 (1998-11-01), Lynch et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Station and process for dispensing a reduced-pressure gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Station and process for dispensing a reduced-pressure gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Station and process for dispensing a reduced-pressure gas will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2039678

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.