Static random access memory cell and method of fabricating the s

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...

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257 66, 365188, H01L 2976, H01L 31036, H01L 31112, G11C 1136

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active

057930597

ABSTRACT:
A static random access memory cell having a plurality of active regions defined on a semiconductor substrate, includes a plurality of first bulk transistors having a first common gate electrode and first impurity-doped regions, the first common gate electrode and first impurity-doped regions being formed on a portion of the active regions; a plurality of second bulk transistors spaced from the first bulk transistors, the second bulk transistors including a second common gate electrode and second impurity-doped regions, the second common gate electrode and second impurity-doped regions being formed on a portion of the active regions; and a plurality of thin film transistors formed on the second bulk transistors and including the second common gate electrode and a conductive layer formed above the second common gate electrode, wherein the conductive layer overlaps and is substantially coextensive with the second common gate electrode.

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International Electron Devices Meeting 1990, San Francisco, CA Dec. 9-12, 1990, Sponsored by Electron Devices Society of IEEE, pp. 18.1.1-18.1.4, no month.
International Electron Devices Meeting 1992, San Francisco, CA Dec. 13-16, 1992, Sponsored by Electron Devices Society of IEEE, pp. 32.7.1-32.7.4.

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