Static RAM cell with conductive straps formed integrally with th

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...

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257369, 257393, 257903, H01L 2904, H01L 2978

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active

052104290

ABSTRACT:
A static RAM cell including first and second bulk transistors having gate electrodes extended over an element isolation region and forming a flip-flop, third and fourth bulk transistors having source and drain regions and formed adjacently to the element isolation region, a first conductive strap layer for self-aligning the gate electrode of the first bulk transistor with the source or drain region of the third bulk transistor, and a second conductive strap layer for self-aligning the gate electrode of the second bulk transistor with the source or drain region of the fourth bulk transistor.

REFERENCES:
patent: 4453175 (1984-06-01), Ariizumi et al.
patent: 4774203 (1988-09-01), Ikeda et al.
patent: 4792841 (1988-12-01), Nagasawa et al.
patent: 4984200 (1991-01-01), Saitoo
patent: 5057898 (1991-10-01), Adan et al.
Patent Abstracts of Japan, vol. 13, No. 404 (E-817) Sep. 7, 1989 and JP-A01 144 655, Jun. 6, 1989.
Patent Abstracts of Japan, vol. 13, No. 404 (E-817) Sep. 7, 1989 and JP-A-1144674 (Hitachi) Jun. 6, 1989.
Pat. Abs. of Japan, vol. 13, No. 433 (E-824) Sep. 27, 1989 and JP-A-1161860 (Hitachi) Jun. 26, 1989.
Int'l Electron Devices Meeting, Dec. 1888, San Francisco, Calif., pp. 48-51; T. Yamanaka et al.: `A 25 UM2 New Poli-Si PMOS Load (PPL) SRAM Cell Having Excellent Soft Error Immunity`.

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