Static pad conditioner

Abrading – Accessory – Dressing

Reexamination Certificate

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Details

C451S444000

Reexamination Certificate

active

10863148

ABSTRACT:
A chemical mechanical polishing apparatus includes a polishing pad. A pad conditioner includes a static conditioner head having a surface area configured to contact and condition the pad. The surface area has a first end proximate to an axis of rotation of the pad and a second end remote from the axis of rotation of the pad. The first end defines a first arc length, and the second end defines a second arc length, where the first arc length and the second arc length are substantially identical.

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patent: 2003/0084894 (2003-05-01), Sung

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