Radiant energy – With charged particle beam deflection or focussing – Magnetic lens
Reexamination Certificate
2006-12-22
2009-06-23
Wells, Nikita (Department: 2881)
Radiant energy
With charged particle beam deflection or focussing
Magnetic lens
C250S492200, C250S492100, C250S492300, C250S306000, C250S307000
Reexamination Certificate
active
07550739
ABSTRACT:
A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.
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Fuse Takashi
Kotsugi Tadashi
Takeya Koji
Tsuboi Kyo
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Tokyo Electron Limited
Wells Nikita
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