Stand-off control apparatus for plasma processing machines

Electric heating – Metal heating – By arc

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Details

21912154, 21912402, 21913001, B23K 1000, B23K 9095

Patent

active

055213502

ABSTRACT:
A stand-off control apparatus for plasma processing machines which is capable of maintaining an optimum stand-off even when a processing speed varies. In a stand-off control apparatus for plasma processing machines which is provided with a microcomputer (4) for maintaining an optimum stand-off (h.sub.0) by moving a torch toward/away from a work so that an independently inputted arc voltage (V) agrees with a speed-corrected target arc voltage (V.sub.O(F)) obtained by correcting a target arc voltage (V.sub.O), which is stored in advance, for an independently inputted processing speed (F), the microcomputer (4) determines at the time of varying a processing speed (F) whether the speed is being accelerated, being decelerated or being kept unchanged, and provides that the speed-corrected target arc voltage (V.sub.O(F)) for the respective case is applied after the lapse of a corresponding delay time (.DELTA.t) which is independently stored.

REFERENCES:
patent: 3949188 (1976-04-01), Tateno
patent: 4550241 (1985-10-01), Scott et al.
patent: 5288970 (1994-02-01), Nishi
patent: 5326955 (1994-07-01), Nishi et al.

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