Stamper, lithographic method of using the stamper and method...

Details Stamper, lithographic method of using the stamper and method... Stamper, lithographic method of using the stamper and method...

2007-03-20

2007-03-20

Hassanzadeh, Parviz (Department: 1763)

Etching a substrate: processes

Forming or treating an article whose final configuration has...

C216S044000

Reexamination Certificate

active

10628275

ABSTRACT:
A stamper includes a substrate and a plurality of protrusions of different heights formed on one of the surfaces of the substrate, the protrusions of larger height having a stack structure formed of at least two layers of at least two types of materials, thereby transferring a plurality of patterns at the same time.

REFERENCES:
patent: 4723903 (1988-02-01), Okazaki et al.
patent: 5494782 (1996-02-01), Maenza et al.
patent: 5772905 (1998-06-01), Chou
patent: 5789117 (1998-08-01), Chen
patent: 5817242 (1998-10-01), Biebuyck et al.
patent: 6127263 (2000-10-01), Parikh
patent: 6190809 (2001-02-01), Tzu et al.
patent: 6306547 (2001-10-01), Kobayashi
patent: 6350360 (2002-02-01), Bonivert et al.
patent: 2002/0050220 (2002-05-01), Schueller et al.
patent: 102 17 089 (2003-10-01), None
patent: 1 003 078 (2000-05-01), None
patent: 1 376 663 (2004-01-01), None
patent: 61-3339 (1986-01-01), None
patent: 2-44539 (1990-02-01), None
patent: 3-100942 (1991-04-01), None
patent: 2000-90487 (2000-03-01), None
patent: WO 03/096123 (2003-11-01), None
Communication and Partial European Search Report issued Oct. 15, 2004, for No. EP 03 01 6539.
Li, et al., “Direct three-dimensional patterning using nanoimprint lithography”, Applied Physics Letters. vol. 78, No. 21, May 21, 2001, pp. 3322-3324.
Mingtao, Li et al., Direct Three-Dimensional Patterning Using Nanoimprint Lithography, Applied Physical Letter, American Institute of Physics, May 21, 2001, vol. 78, No. 21, pp. 3322-3324.
European Search Report dated May 6, 2005 in EP 03 01 6539.

Affiliated with

Also associated with

Rating

Stamper, lithographic method of using the stamper and method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Stamper, lithographic method of using the stamper and method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stamper, lithographic method of using the stamper and method... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3763812