Stainproof protector made from fluorine-containing aliphatic cyc

Details Stainproof protector made from fluorine-containing aliphatic cyc Stainproof protector made from fluorine-containing aliphatic cyc

1993-01-22

1994-10-18

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430273, 430302, 430961, 359507, 359511, 359896, 428422, G03F 711

Patent

active

053567390

ABSTRACT:
A stainproof protector for preventing a mask for lithography from staining, which has a protective film made of a polymer having a fluorine-containing aliphatic cyclic structure.

REFERENCES:
patent: 4657805 (1987-04-01), Fukumitsu et al.
patent: 5008156 (1991-04-01), Hong
patent: 5061024 (1991-10-01), Keys
patent: 5117272 (1992-05-01), Nomura et al.

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