Stain resistant protective overcoat for imaged photographic elem

Details Stain resistant protective overcoat for imaged photographic elem Stain resistant protective overcoat for imaged photographic elem

1998-02-05

1999-11-30

Huff, Mark F.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Structurally defined

430 18, 430531, 430533, 430961, 430527, 430530, G03K 189, G03K 185, G03K 176

Patent

active

059940050

ABSTRACT:
The present invention is an imaged photographic element including a support, having at least one silver halide emulsion layer, and having at least one stain resistant overcoat layer. The stain resistant overcoat layer contains a fluoro(meth)acrylate interpolymer having two different segments, one of which is fluorinated and oleophobic and the other of which is hydratable. The stain resistant overcoat is applied to the photographic element after film processing.

REFERENCES:
patent: 4229524 (1980-10-01), Yoneyama et al.
patent: 5756273 (1998-05-01), Wang et al.

Affiliated with

Also associated with

Rating

Stain resistant protective overcoat for imaged photographic elem does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Stain resistant protective overcoat for imaged photographic elem, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stain resistant protective overcoat for imaged photographic elem will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1669440