Compositions – Durable finishes for textile materials – or processes of...
Reexamination Certificate
1998-10-20
2001-08-28
Delcotto, Gregory (Department: 1751)
Compositions
Durable finishes for textile materials, or processes of...
C252S008620, C008S115620, C008S115640, C008S557000, C008S560000, C008S589000
Reexamination Certificate
active
06280648
ABSTRACT:
FIELD OF THE INVENTION
The present invention generally relates to a stain resistant composition for polyamide substrates and to a process for making and applying the composition. More particularly, the present invention is directed to combining an addition polymer which comprises a partially sulfonated styrene-maleic copolymer with one or more sulfonated novolak resins.
BACKGROUND OF THE INVENTION
Polyamide fibers, such as nylon fibers, are useful in producing many different and various textile products. In particular, polyamide fibers are well suited for constructing carpeting. For instance, nylon carpeting is durable, has good aesthetic properties and is relatively inexpensive. Further, nylon carpeting is very receptive to acid dyes and thus can be produced in a wide variety of colors.
Unfortunately, nylon carpeting and other polyamide products are susceptible to staining. For example, many food and beverage items, such as coffee, fruit juices, and wine, contain natural ingredients which can bind to dye sites located on polyamide materials. Further, many artificial colorants and pigments that are added to food and beverage products can also permanently stain polyamide fibers. Such colorants and pigments are typically added to powdered drink mixes, to gelatin desserts, and to various soft drinks.
In the past, many attempts have been made to make stain resistant polyamide fibers and, in particular, to produce stain resistant carpeting. For instance, in the past, carpet fibers have been coated with liquid resistant coatings which inhibit wetting of the carpet surface. These coatings, however, have a tendency to wear off over time.
In the past, polyamide carpet fibers have also been treated with stain blocking compositions that actually bind to available dye sites that remain on the fibers after the fibers have been dyed a particular color. For example, various sulfonated novolak resins have been used for this purpose. Novolak resins include syntans, resoles and generally comprise sulfonated phenol and napthalene formaldehyde condensates. In the past, sulfonated novolak resins have proven to be very effective in providing polyamide materials with stain resistant characteristics. Unfortunately, however, novolak resins have a tendency to discolor when exposed to sunlight or other sources of ultraviolet light. As a result, polyamide materials treated with sulfonated novolak resins, such as carpeting, can yellow or otherwise discolor over time. As such, a need currently exists for an improved stain blocking composition for polyamide materials that binds to available dye sites but does not significantly cause discoloration of the materials after application. Specifically, it would be particularly desirable if a stain blocking agent could be fabricated that would work in conjunction with sulfonated novolak resins in a manner so as to decrease the amount used and hence decrease discoloration when exposed to light.
SUMMARY OF THE INVENTION
The present invention recognizes and addresses the foregoing drawbacks and deficiencies of prior art constructions and methods.
Accordingly, it is an object of the present invention to provide an improved stain blocking composition for treating polyamide materials for making the materials stain resistant.
Another object of the present invention is to provide a stain blocking composition that can work in conjunction with sulfonated novolak resins in rendering polyamide materials stain and light resistant.
It is another object of the present invention to provide a stain blocking composition for polyamides that contains a partially sulfonated styrene-maleic copolymer.
Still another object of the present invention is to provide a stain blocking composition for polyamides, such as nylon and nylon blends, that contains a partially sulfonated styrene-maleic copolymer formed by sulfonating and hydrolyzing a styrene-maleic anhydride copolymer.
Another object of the present invention is to provide a stain blocking composition for treating polyamides that contains at least one sulfonated novolak resin, a partially sulfonated styrene-maleic copolymer, a dispersant, fluorocarbon repellents, and a magnesium salt.
These and other objects of the present invention are achieved by providing a stain blocking composition adapted to bind to available dye sites contained in a polyamide material for making the polyamide material stain resistant. The composition includes a sulfonated novolak resin and an addition polymer. Specifically, the addition polymer is a partially sulfonated styrene-maleic copolymer. For instance, from about 2 mole percent to about 20 mole percent of the styrene units contained within the styrene-maleic copolymer can be sulfonated. In one preferred embodiment, 10 mole percent or less of the styrene units are sulfonated.
The molar ratio of styrene to maleic acid contained within the copolymer can be in a range of from about 1:1 to about 3:1 respectively. In most applications, the partially sulfonated styrene-maleic copolymer contains maleic acid in an amount from about 25 mole percent to about 50 mole percent, styrene in an amount from about 50 mole percent to about 75 mole percent, and sulfonated styrene in an amount from about 2 mole percent to about 20 mole percent based on the styrene charge.
In one embodiment, the partially sulfonated styrene-maleic copolymer can be formed by partially sulfonating a styrene-maleic anhydride copolymer and then later hydrolyzing the copolymer with water and a metal base, such as sodium hydroxide or potassium hydroxide. In this embodiment, a metal salt of a partially sulfonated styrene-maleic copolymer is formed and used as the addition polymer. According to this process, the sulfonate groups are believed to be randomly distributed throughout the polymer. Further, the sulfonate groups are usually either in the ortho or the para position.
More particularly, in one embodiment, the partially sulfonated styrene-maleic copolymer can be formed by first dissolving a styrene-maleic anhydride copolymer in a solvent, such as 1,2-dichloroethane, in order to form a polymer solution. A variety of sulfonating agents, such as sulfuric acid, sulfur trioxide, oleum, and other suitable agents can be added to the polymer solution in an amount sufficient to sulfonate from about 2 mole percent to about 20 mole percent of the styrene contained in the copolymer. Once the copolymer is sulfonated, water and a metal hydroxide are then added to the solution to form a metal salt of the partially sulfonated styrene-maleic copolymer. Once the copolymer is hydrolyzed, the solvent can be removed by distillation. If desired, an acid can then be added to the resulting polymer solution to lower the pH. Once the pH has been adjusted, the solution is ready for use in the composition of the present invention.
When applied to a polyamide material, the sulfonated novolak resin and the addition polymer of the present invention can be contained within an aqueous solution or bath. For instance, the sulfonated novolak resin can be present in an amount from 0.5 grams/liter to 2 grams/liter, while the addition polymer can be present in the solution in an amount from about 4 grams/liter to 8 grams/liter.
Besides containing a sulfonated novolak resin and the addition copolymer, the composition of the present invention can include various other ingredients that facilitate application or otherwise assist in rendering a polyamide material stain resistant. For instance, dispersants and emulsifiers can be included within the composition of the present invention. In one embodiment, an arylalkyl sulfonate salt can be added to the composition, such as Tanapure™ AC and Dowfax™2A1.
Preferably, the composition of the present invention further contains a metal donor, such as a magnesium salt, which facilitates application of the addition polymer to the polyamide substrate. For example, magnesium salts that may be included in the composition include magnesium chloride, magnesium acetate, magnesium nitrate, magnesium sulfamate, magnesium dihydrogen phosphate, magnesium sulfate
Konzelman Jim
Login Robert B.
MacEwen David A.
Delcotto Gregory
Dority & Manning P.A.
Sybron Chemicals Inc.
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