Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate
1999-06-03
2001-11-20
Adams, Russell (Department: 2851)
Photocopying
Projection printing and copying cameras
Step and repeat
C355S072000, C355S075000, C074S490090, C318S640000
Reexamination Certificate
active
06320645
ABSTRACT:
FIELD OF THE INVENTION AND RELATED ART
This invention relates generally to an exposure apparatus for use in the production of semiconductor devices through printing, by exposure, a design pattern on a resist of a substrate. More particularly, the invention is concerned with a stage system suitably usable in such exposure apparatus. According to another aspect, the invention is directed to an exposure apparatus having such stage system or a device manufacturing method using the same.
As such exposure apparatuses, there are 1) steppers wherein, while moving, a substrate, such as a wafer, stepwise, a pattern of an original is printed on different exposure regions of the substrate, by exposure through a projection optical system, and 2) scan-type exposure apparatuses wherein an original, such as a mask, and a substrate are scanningly moved in synchronism with each other and relative to a projection optical system so that a pattern of the original is printed on the substrate.
In addition thereto, step-and-scan type exposure apparatuses have recently been proposed in an attempt to performing high precision exposure of fine pattern, in which stepwise motion and scanning exposure as described above are repeated so that fine patterns are printed on different regions on a substrate precisely. In this type of exposure apparatus, since only a portion of a projection optical system relatively close to its optical axis is used with restriction by a slit, higher precision and wider picture angle printing of a fine pattern is enabled.
However, in high precision and fine exposure apparatus, such as step-and-scan type exposure apparatus, in order that the performance of a projection optical system is fully utilized to practically improve the exposure precision, the positional registration between an original and a substrate should be further improved.
SUMMARY OF THE INVENTION
It is an object of the present invention to provide a novel concept for improving the positional registration in a stage system usable in an exposure apparatus, for example.
In accordance with an aspect of the present invention, there is provided a stage system, comprising: a movable stage; a guide mechanism for guiding the stage with respect to a predetermined direction; and a preloading mechanism for producing a magnetic attraction force with which the rigidity of the guide mechanism can be increased; wherein a portion to be attracted by the magnetic attraction force is made of a material having a product of residual magnetic flux density Br and holding force Hc in a hysteresis curve, not greater than 100 J/m
3
.
In one preferred form of this aspect of the present invention, the guide mechanism has a guiding surface including a portion to be attracted by the magnetic attraction force, and a gas or air bearing disposed between the guiding surface and the stage.
The preloading mechanism may include a magnet provided on the stage side.
The portion to be attracted by the magnetic attraction force may contain one of (i) Ni-Fe alloy containing permalloy and including 30 or more weight percent Ni, (ii) Si-Fe alloy including 1 or more weight percent Si, and (iii) pure iron.
The stage may be supported on a guiding surface of a stage base.
The stage may be made movable two-dimensionally along a guiding surface.
The stage may include a first stage supported by a guiding surface of a stage base and being movable in a first direction, and a second stage supported by a guiding surface of the stage base and being movable in a second direction relative to the first stage, wherein at least the second stage may be provided with a preloading mechanism.
The stage may be guided by a yawing guide with respect to a yawing direction in which the stage is to be moved.
The stage may be provided with a preloading mechanism for applying a preloading force between it and the yawing guide.
The stage system may include a linear motor for moving the stage.
In accordance with another aspect of the present invention, there is provided an exposure apparatus, comprising: an exposure system for performing an exposure process to a substrate to be exposed; and a stage system including (i) a movable stage, (ii) a guide mechanism for guiding the stage with respect to a predetermined direction, and (iii) a preloading mechanism for producing a magnetic attraction force with which the rigidity of the guide mechanism can be increased; wherein a portion to be attracted by the magnetic attraction force is made of a material having a product of residual magnetic flux density Br and a holding force Hc in hysteresis curve, not greater than 100 J/m
3
.
In one preferred form of this aspect of the present invention, the scanning exposure is performed while moving the substrate with the stage.
The exposure may be performed in accordance with a step-and-scan method.
In accordance with a further aspect of the present invention, there is provided a device manufacturing method, comprising the steps of: preparing an exposure apparatus as recited above; and performing an exposure process to a substrate by use of the exposure apparatus.
In one preferred form of this aspect of the present invention, the method further comprises applying a photosensitive material to the substrate, and developing the exposed substrate.
These and other objects, features and advantages of the present invention will become more apparent upon a consideration of the following description of the preferred embodiments of the present invention taken in conjunction with the accompanying drawings.
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Inoue Mitsuru
Korenaga Nobushige
Tokuda Yukio
Adams Russell
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Kim Peter B.
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