Stage, substrate processing apparatus, plasma processing...

Details Stage, substrate processing apparatus, plasma processing... Stage, substrate processing apparatus, plasma processing...

2011-06-07

2011-06-07

Paschall, Mark H (Department: 3742)

Electric heating

Heating devices

With power supply and voltage or current regulation or...

C219S121430, C219S121480, C118S725000, C392S418000

Reexamination Certificate

active

07956310

ABSTRACT:
A stage onto which is electrostatically attracted a substrate to be processed in a substrate processing apparatus, which enables the semiconductor device yield to be improved. A temperature measuring apparatus200measures a temperature of the substrate to be processed. A temperature control unit400carries out temperature adjustment on the substrate to be processed such as to become equal to a target temperature based on a preset parameter. A temperature control unit400controls the temperature of the substrate to be processed by controlling the temperature adjustment by the temperature control unit400based on a measured temperature measured by the temperature measuring apparatus200.

REFERENCES:
patent: 6325948 (2001-12-01), Chen et al.
patent: 6353210 (2002-03-01), Norrbakhsh et al.
patent: 7274004 (2007-09-01), Benjamin et al.
patent: 7603028 (2009-10-01), Yassour et al.
patent: 2005/0172904 (2005-08-01), Koshimizu et al.

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