Stage-drive control apparatus and method, and scan-projection ty

Details Stage-drive control apparatus and method, and scan-projection ty Stage-drive control apparatus and method, and scan-projection ty

1997-06-16

1999-05-04

Masih, Karen

Electricity: motive power systems

Positional servo systems

Plural servomotors

318560, 31856817, 318592, G05B 1132

Patent

active

059007079

ABSTRACT:
A scan-projection type exposure apparatus quickly suppresses disturbance in synchronization between a wafer stage and a reticle stage, and enables high-precision pattern exposure. This apparatus employs a master-slave control with a wafer-stage side as the master with a reticle-stage side as the slave, so as to correct a target value of a position control system of a rough-motion stage or that of a position control system of the reticle stage by using motion-mode errors e.sub.g, e.theta..sub.x and e.theta..sub.y in a one-to-one correspondence with a disturbance occurring to the rough-motion stage of the wafer stage due to movement of a fine-motion stage of the wafer stage.

REFERENCES:
patent: 4132898 (1979-01-01), Buelow et al.
patent: 4676630 (1987-06-01), Matsushita et al.
patent: 5504407 (1996-04-01), Wakui et al.
patent: 5511930 (1996-04-01), Sato et al.
patent: 5568032 (1996-10-01), Wakui
patent: 5663783 (1997-09-01), Ueda

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