Stage device, method of controlling same, and exposure apparatus

Details Stage device, method of controlling same, and exposure apparatus Stage device, method of controlling same, and exposure apparatus

1997-12-02

1999-12-28

Metjahic, Safet

Photocopying

Projection printing and copying cameras

Step and repeat

355 72, G03B 2742, G03B 2758

Patent

active

060088826

ABSTRACT:
A precision stage is provided so as to be movable along the Z axis, in the .theta. direction, which is the direction of rotation about the Z axis, and in two oblique directions inclined with respect to the Z axis. The stage has a sensor for measuring stage position along the Z axis. Reference-position return of this sensor is carried out. Reference-position return of two Y laser interferometers for measuring the .theta. position of the precision stage is carried out in a state in which the positions of the precision stage in the direction along the Z axis and in the oblique directions are held at predetermined reference positions. After this reference-position return is carried out, reference-position return is performed with regard to an X laser interferometer and the two Y laser interferometers in a state in which the positions of the precision stage in the direction along the Z axis, in the oblique directions and in the .theta. direction are held at predetermined reference positions.

REFERENCES:
patent: 5182615 (1993-01-01), Kurosawa et al.
patent: 5184055 (1993-02-01), Ohishi et al.
patent: 5382095 (1995-01-01), Akutsu
patent: 5473424 (1995-12-01), Okumura
patent: 5524502 (1996-06-01), Osanai
patent: 5532822 (1996-07-01), Shinozaki et al.
patent: 5696590 (1997-12-01), Makita
patent: 5701041 (1997-12-01), Akutsu et al.
patent: 5717482 (1998-02-01), Akutsu et al.
patent: 5726548 (1998-03-01), Chiba et al.
patent: 5760561 (1998-06-01), Chinju et al.
patent: 5883702 (1999-03-01), Tokunaga

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