Stage device and exposure apparatus

Optics: measuring and testing – By light interference – For dimensional measurement

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C356S508000

Reexamination Certificate

active

06897963

ABSTRACT:
A stage device suitable for exposure apparatus used to produce semiconductor devices, is movable in an area wider than the measurement area of interferometer for position measurement, and is capable of measuring the position with high precision. When a movable stage moves from the position where the laser beams from laser interferometers are not applied into the measurement area of the laser interferometer, the position of reference mark is measured by a wafer alignment sensor, and the measurement value measured by the laser interferometer is corrected based on the results of the measurement by the wafer alignment sensor. When another movable stage enters the measurement area of the laser interferometer, the position of the reference mark is similarly measured by a wafer alignment sensor, and the measurement value measured by the laser interferometer is corrected based on the results of the measurement by the wafer alignment sensor.

REFERENCES:
patent: 3941480 (1976-03-01), Webster et al.
patent: 4265542 (1981-05-01), Snow
patent: 4332473 (1982-06-01), Ono
patent: 4984891 (1991-01-01), Miyazaki et al.
patent: 5506684 (1996-04-01), Ota et al.
patent: 5523841 (1996-06-01), Nara et al.
patent: 5523843 (1996-06-01), Yamane et al.
patent: 5677758 (1997-10-01), McEachern et al.
patent: 5784166 (1998-07-01), Sogard
patent: 6084673 (2000-07-01), Van Den Brink et al.
patent: 6211965 (2001-04-01), Tsuchiya et al.
patent: 6341007 (2002-01-01), Nishi et al.
patent: 6404505 (2002-06-01), Matsui
patent: 0 951 054 (1999-10-01), None
patent: 01030242 (1989-02-01), None
patent: A-4-225514 (1992-08-01), None
patent: A-6-163348 (1994-06-01), None
patent: A-7-240367 (1995-09-01), None
patent: A-7-253304 (1995-10-01), None
patent: 410214783 (1998-08-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Stage device and exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Stage device and exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stage device and exposure apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3370753

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.