Stage control method and apparatus with varying stage controller

Details Stage control method and apparatus with varying stage controller Stage control method and apparatus with varying stage controller

1996-05-17

1999-08-17

Shah, Kamini

Data processing: measuring, calibrating, or testing

Measurement system

Orientation or position

364151, 355 53, 356 285, G03B 2742

Patent

active

059407891

ABSTRACT:
An improvement in the performance characteristics of a controller for a high precision positioning system, by continuously updating a variable parameter in the controller transfer function in response to, and as a continuously monotonically decreasing function of, the measured position error signal, with a small error cutoff. The error convergence, noise, and stability characteristics of the controller are improved over that of a constant-parameter controller. The variable parameter can also be tailored to prevent saturation of the amplifier that is driven by the controller and which drives the mechanical system whose position is being controlled.

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Jere D. Buckley, et al., "Step-and-Scan Lithography Using Reduction Optics", The Perkin-Elmer Corporation, Optical Lithography Operations, 24 pgs., Undated.

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