Stacked annealing system

Details Stacked annealing system Stacked annealing system

2007-03-20

2007-03-20

Robinson, Daniel (Department: 3742)

Electric resistance heating devices

Heating devices

Radiant heater

C118S724000

Reexamination Certificate

active

11144359

ABSTRACT:
A process chamber includes an opening, two or more stacked cold plates adjacent the opening, two or more stacked hot plates adjacent the cold plates, and a rotatable wafer transport capable of moving a wafer between the cold plates and between the hot plates for processing of the wafer. The wafer can be rapidly heated while between the hot plates. The wafer transport has perpendicular walls about a pivot such that when the wafer is between the cold plates or between the hot plates, one of the walls separates the cold and hot portions, thereby increasing the efficiency of cooling and heating.

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