Cleaning and liquid contact with solids – Apparatus – With means to movably mount or movably support the work or...
Reexamination Certificate
2005-08-02
2005-08-02
Markoff, Alexander (Department: 1746)
Cleaning and liquid contact with solids
Apparatus
With means to movably mount or movably support the work or...
C134S186000, C134S902000
Reexamination Certificate
active
06923192
ABSTRACT:
A substrate processing system has a first substrate cleaner and a second substrate cleaner. The first substrate cleaner comprises a forward portion and a rear portion. The forward portion includes a rotatable substrate support. The rear portion is vertically thicker than the forward portion. The rear portion includes a device for rotating the support. The second substrate cleaner includes the elements included in the first substrate cleaner. The second substrate cleaner is stacked above the first substrate cleaner with the forward portions being vertically aligned and the rear portions being vertically aligned. A space is formed between the forward portions to permit access to the forward portion of the first substrate cleaner and to permit ample gas flow into the area between the forward portions of the first and the second substrate cleaners.
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Hosack Chad M.
Patel Paul
Standt Raoul
Belles Brian L.
Fein Michael B.
Goldfinger Technologies, LLC
Markoff Alexander
O'Connor Cozen
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