Stablization of oxidation-sensitive or UV-sensitive active...

Details Stablization of oxidation-sensitive or UV-sensitive active... Stablization of oxidation-sensitive or UV-sensitive active...

2007-05-08

2007-05-08

Dodson, Shelley A. (Department: 1616)

Drug, bio-affecting and body treating compositions

Topical sun or radiation screening, or tanning preparations

C424S060000, C424S400000, C424S401000, C514S241000

Reexamination Certificate

active

10789881

ABSTRACT:
Cosmetic and dermatological formulations comprising at least one hydrophilic active ingredient and at least one dialkyl naphthalate which is characterized by the structural formulain which R1and R2, independently of one another, are selected from the group of branched and unbranched alkyl groups having 6 to 24 carbon atoms, have been found to be stable and effective, particularly in moisturizing the skin or protection the skin from skin aging.

REFERENCES:
patent: 5993789 (1999-11-01), Bonda et al.
patent: 6113931 (2000-09-01), Bonda et al.
patent: 6126925 (2000-10-01), Bonda et al.
patent: 6129909 (2000-10-01), Bonda et al.
patent: 6180091 (2001-01-01), Bonda et al.
patent: 6284916 (2001-09-01), Bonda et al.
patent: 6355230 (2002-03-01), Gers-Barlag et al.
patent: 6355261 (2002-03-01), Bonda et al.
patent: 6368578 (2002-04-01), Gers-Barlag et al.
patent: 6403067 (2002-06-01), Schamper et al.
patent: 6468511 (2002-10-01), Chopra et al.
patent: 6491901 (2002-12-01), Gers-Barlag et al.
patent: 2001/0022966 (2001-09-01), Gers-Barlag et al.
patent: 2001/0026790 (2001-10-01), Gers-Barlag et al.
patent: 2002/0164296 (2002-11-01), Schamper et al.
patent: 2002/0192172 (2002-12-01), Chopra et al.
patent: 2003/0170284 (2003-09-01), Dorschner et al.
patent: 2 801 206 (2001-05-01), None
patent: 2 801 207 (2001-05-01), None
patent: 2 801 208 (2001-05-01), None
patent: 2 801 209 (2001-05-01), None
patent: 199 49 825 (2001-05-01), None
patent: 2 801 210 (2004-05-01), None
patent: 2 801 213 (2004-05-01), None
patent: 660131 (1951-10-01), None
patent: WO 02 17873 (2002-03-01), None
Bonda C et al: “A New Photostabilizer For Full Spectrum Sunscreens” Cosmetics & Toiletries, Wheaton, IL, US, vol. 115, No. 6, 2000, pp. 37-45.
International Search Report from corresponding International Application No. PCT/EP02/09309 dated Sep. 30, 2003.
International Search Report from corresponding International Application No. PCT/EP02/09374 dated Sep. 30, 2003.
International Search Report from corresponding International Application No. PCT/EP02/09375 dated Dec. 10, 2002.
International Search Report from corresponding Internatioanl Application No. PCT/EP02/09567, date Sep. 30, 2003.
International Search Report from corresponding International Application No. PCT/EP02/09543 dated Oct. 2, 2003.
International Search Report from corresponding International Application No. PCT/EP02/009310 dated Apr. 12, 2002.
German Search Report for 101 41 474.9 dated Apr. 15, 2002.
German Search Report for 101 41 478.1 dated Apr. 15, 2002.
German Search Report for 101 41 475.7 dated Jul. 19, 2002.
“Illinois Researcher Recieves Award for Developing a Better Sunscreen,” EurekAlert! released Jun. 7, 2001 (http://www.eurekalert.org).
“Beauty is Skin Deep,” Household and Personal Products Industry (HAPPI), posted online Sep. 2000 (http//www.happi.com/special/sep002.htm).
International Search Report from corresponding International Application No. PCT/EP02/08577, dated Dec. 20, 2002.
German Search Report dated Mar. 27, 2002 for German Application No. DE 101 41 472.2.
German Search Report dated Apr. 12, 2002 for German Applicaiton No. DE 101 41 473.0.

Affiliated with

Also associated with

Rating

Stablization of oxidation-sensitive or UV-sensitive active... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Stablization of oxidation-sensitive or UV-sensitive active..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stablization of oxidation-sensitive or UV-sensitive active... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3778377