Chemistry of inorganic compounds – Silicon or compound thereof – Binary compound
Patent
1981-11-16
1983-08-09
Straub, Gary P.
Chemistry of inorganic compounds
Silicon or compound thereof
Binary compound
423324, 501 97, C01B 2168, C01B 3306, C01B 3300
Patent
active
043978282
ABSTRACT:
Stable, viscous polymers of silicon, nitrogen and hydrogen are formed by reacting a halosilane with ammonia in the presence of a solvent comprising an aliphatic ether, a chloromethane or mixtures thereof. After the solvent has been removed from the reaction product, the polymer can be poured into a container of desired shape and then can be sintered to form a uniform silicon nitride product.
REFERENCES:
patent: 3959446 (1976-05-01), Mazdiyasni et al.
patent: 4122220 (1978-10-01), Sussmuth
Glemser et al., Uberdenthernischen Abbau von Siliciumdiimid Si(NH).sub.2 Z, Anorg, Allge. Chem., Jan. 1959, pp. 134-141.
Kato et al., Finely Divided Silicion Nitride from Vapor Phase Reaction Between Silicion Tetrachloride and Ammonia, Yogyo-Kyokai-Shi, 80 (3), pp. 28-34, 1972.
Mazdiyasni et al., Synthesis, Characterization and Consolidation of Si.sub.3 NY Obtained from the Ammonolysis of SiCl.sub.4, J. Amer. Ceramic, Soc. 56 12, pp. 628-633, 1973.
Gill et al., Self Bonded Silicon Nitride, The Refractory Journal, Mar. 1962, pp. 92-95.
Prud'Homme Christian C.
Seyferth Dietmar
Wiseman Gary H.
Cook Paul J.
Massachusetts Institute of Technology
Smith, Jr. Arthur A.
Straub Gary P.
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