Stable inorganic polymers

Details Stable inorganic polymers Stable inorganic polymers

1998-03-12

2000-01-18

Marquis, Melvyn I.

Compositions: coating or plastic

Coating or plastic compositions

Silicon containing other than solely as silicon dioxide or...

528 21, 528 31, 524315, 524361, 524366, 524367, C08G 7704

Patent

active

060154578

ABSTRACT:
Processes for producing poly (hydrido siloxane) copolymers and processes for producing solutions of such copolymers for coating semiconductor substrates are provided. The copolymers have the general formula: (HSiO.sub.1.5).sub.a (HSiO(OR)).sub.b (SiO.sub.2).sub.c, wherein R is a mixture of H and an alkyl group having between 1 and 4 carbon atoms; a+b+c=1; 0.5<a<0.99; 0.01<b<0.5; and 0<c<0.5. Processes for producing the copolymers use alkoxysilanes as starting materials. Processes for producing coating solutions include removal of water and alcohol. Films of such coating solutions are useful as planarizing dielectric layers.

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Hacker, N., "Organic and Inorganic Spin-On Polymers for Low-Dielectric-Constant Applications," MRS Bulletin, vol. 22, No. 10, Oct. 1997, pp. 33-38.

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