Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1996-02-20
1997-04-29
Langel, Wayne
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
210681, C01B 3332
Patent
active
056246510
ABSTRACT:
Disclosed is a method of increasing the silica to metal oxide ratio in alkali metal silicate solutions by removing smaller size anions from the solution using a strong cation exchange resin comprising: condensing the smaller size anions as silica in the pores of the strong cation exchange resin; leaving the larger, more siliceous anions in the external solution.
REFERENCES:
patent: 2244325 (1941-06-01), Bird
patent: 2631134 (1953-03-01), Iler et al.
patent: 2650200 (1953-08-01), Iler et al.
patent: 3113112 (1963-12-01), McNally et al.
patent: 3492137 (1970-01-01), Iler
patent: 3533816 (1970-10-01), Oken
patent: 3625722 (1971-12-01), Freyhold et al.
Joyce Karen
Langel Wayne
Posner Ernest G.
PQ Corporation
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