Drug – bio-affecting and body treating compositions – Topical sun or radiation screening – or tanning preparations
Patent
1989-05-31
1991-04-02
Ore, Dale R.
Drug, bio-affecting and body treating compositions
Topical sun or radiation screening, or tanning preparations
424 60, 424 73, 514846, 514939, A61K 715, A61K 742, A61K 744, A61K 750
Patent
active
050045989
ABSTRACT:
This invention relates to stable oil-in-water emulsions and to products based on such emulsions which contain a modified polymer which is a copolymer of a preponderant amount of an acrylic acid and a smaller amount of a long chain acrylate monomer which modified polymer renders the emulsions stable for over a year at room temperature and which imparts to the emulsions the quick breaking property whereby the emulsions break on coming in contact with an electrolyte or skin, instantaneously coalescing and releasing oil from the emulsions.
REFERENCES:
patent: 3406238 (1968-10-01), Freyermuth et al.
patent: 3529055 (1970-09-01), Skoultchi et al.
patent: 3670074 (1972-06-01), Doner
patent: 3784488 (1974-01-01), Steinhauer et al.
patent: 4172122 (1979-10-01), Kubik et al.
patent: 4421902 (1983-12-01), Chang et al.
patent: 4552755 (1985-11-01), Randen
patent: 4597963 (1986-07-01), Deckner
Polymers in Emulsification, Soap and Chemical Specialties, Apr.-May, 1961.
Effect of Neutralizing Amine on the Stability of Emulsions Prepared with Carboxy Vinyl Polymers, J. Soc. Cosmetic Chemists, vol. 20, pp. 215-223, Mar. 4, 1969.
Castaneda Janet Y.
Hemker Wilfred J.
Lochhead Robert Y.
Kaeding Konrad H.
Kap George A.
Ore Dale R.
The B. F. Goodrich Company
LandOfFree
Stable and quick-breaking topical skin compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Stable and quick-breaking topical skin compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stable and quick-breaking topical skin compositions will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-326015