Radiation imagery chemistry: process – composition – or product th – Nonradiation sensitive image processing compositions or... – Fixer
Patent
1978-10-16
1980-03-11
Smith, John D.
Radiation imagery chemistry: process, composition, or product th
Nonradiation sensitive image processing compositions or...
Fixer
106 105, 106 111, 252188, 252182, 427304, 427305, 427306, 430449, 430413, 430423, C23C 302
Patent
active
041927648
ABSTRACT:
A method for depositing a metal on a surface is disclosed. The method comprises treating the surface with a sensitizing solution comprising at least a reducible salt of a non-noble metal and a radiation-sensitive reducing agent for the salt to form a sensitized surface. The sensitized surface is exposed to a source of light radiation to reduce the metal salt to a reduced metal salt species. Either or both of the preceding sensitizing or radiation exposing steps is restricted to a selected pattern on the surface to form a catalytic real image capable of directly catalyzing the deposition of a metal thereon from an electroless metal deposition solution. The catalytic real image is treated with a stabilizer comprising (a) a reducing agent for the non-noble metal ions of said reducible salt, (b) a complexing agent and (c) an accelerator to at least stabilize the catalytic real image.
REFERENCES:
patent: 3485643 (1969-12-01), Zeblisky et al.
patent: 3772056 (1973-11-01), Polichette et al.
patent: 3772078 (1973-11-01), Polichette et al.
patent: 3907621 (1975-09-01), Polichette et al.
patent: 3925578 (1975-12-01), Polichette et al.
patent: 3930963 (1976-01-01), Polichette et al.
patent: 3935013 (1976-01-01), Lelental
patent: 3942983 (1976-03-01), DiBlas et al.
patent: 4084023 (1978-04-01), Dafter
Jonker et al., "Principles of PD Recording Systems and Their Use in Photofabrication", Journal of Photographic Science, vol. 19, 1971 (pp. 96-105).
Smith John D.
Spivak Joel F.
Western Electric Company Inc.
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