Stabilized plasmatron

Details Stabilized plasmatron Stabilized plasmatron

1976-02-23

1977-07-12

Demeo, Palmer C.

Electric lamp and discharge devices

Fluent material supply or flow directing means

Plasma

H05H 100

Patent

active

040356841

ABSTRACT:
Facilities for introducing an additive of arbitrary material state to a plasma stream in a plasmatron is described. An arc discharge established between the cathode and the anode of the plasmatron cooperates with a stream of ionizable gas introduced into the region between such electrodes to produce a plasma stream in a direction toward the anode. An outlet nozzle axially disposed in the anode for ejecting the plasma stream under pressure communicates with an oblique passage extending through the anode for the introduction of the additive into the plasma stream. A plasma stabilization arrangement in the form of apertured plates are disposed in the space between the anode and the cathode, the apertures in the plates being coaxial with and having a diameter larger than the diameter of the nozzle.

REFERENCES:
patent: 3304402 (1967-02-01), Thorpe
patent: 3684911 (1972-08-01), Perugini et al.

Affiliated with

Also associated with

Rating

Stabilized plasmatron does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Stabilized plasmatron, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stabilized plasmatron will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-489933