Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...
Patent
1985-07-15
1987-06-30
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Having means to expose a portion of a substrate to coating...
118721, 118504, 118505, C23C 1600
Patent
active
046761934
ABSTRACT:
A stabilized mask assembly for direct deposition of a thin film pattern onto a substrate having a dimensionally stabilized mask supporting frame which includes an opening extending therethrough and defining a surface extending circumferentially around the opening, a relatively thin, substantially planar mask having a predetermined yield strength and selected geometrical shape and dimension wherein the mask is positioned adjacent the opening with the periphery of the mask circumferentially contiguous the circumferentially extending surface and wherein the mask has at least one aperture extending therethrough and arranged in a predetermined location defining a thin film pattern, and a securing device for rigidly affixing the periphery of the mask to the circumferentially extending surface with a substantially uniform tension applied to and in the plane of the mask and wherein the tension has a magnitude which establishes a stress on the mask during use which is less than the predetermined yield strength of the mask over a temperature range of a deposition process including operating temperatures of a deposition environment and being adapted to maintain a tension thereon of sufficient magnitude to keep the mask under tension independent of variations in tension due to the thermal expansion characteristics of the mask to dimensionally stabilize the thin film pattern at the operating temperatures of a deposition environment is shown.
A method of fabricating a stabilized mask for direct deposition of a thin film pattern onto a substrate is also shown.
REFERENCES:
patent: 2969296 (1961-01-01), Walsh
patent: 3207126 (1965-09-01), Byron
patent: 3230109 (1966-01-01), Domaleski
patent: 3241519 (1966-03-01), Lloyd
patent: 3315637 (1967-04-01), Taylor
patent: 3574012 (1971-04-01), Penberg
patent: 4372248 (1983-02-01), Martin
Applied Magnetics Corporation
Bueker Richard
Meaney, Jr. Daniel J.
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