Stabilized hypohalite compositions

Details Stabilized hypohalite compositions Stabilized hypohalite compositions

1992-10-02

1995-01-10

Stoll, Robert L.

Compositions

Oxidative bleachant, oxidant containing, or generative

Composition containing a stabilizer or a product in the form...

2521872, 25218724, 25218725, 25218727, C01B 1106, C01B 1120, C01B 1122

Patent

active

053804589

ABSTRACT:
The present invention provides for dilute aqueous hypohalite solutions stabilized against decomposition catalyzed by copper ions present in said solution containing a small amount of a multidentate heteroaromatic stabilizer compound including the general structure selected from: ##STR1## wherein Ar is comprised of carbon or carbon and nitrogen atoms sufficient to form a 5 or 6 membered aromatic ring or at least one other ring condensed with said 5 or 6 membered aromatic ring, X is selected from the group consisting of nitrogen or carbon which form part of an aromatic ring structure and oxygen, and Y is nitrogen or carbon which form part of an aromatic ring structure.
This invention also provides stable hypohalite-containing aqueous bleach, detergent and disinfectant formulations which retain hypohalite stability even after further dilution with copper-contaminated water.

REFERENCES:
patent: 3532634 (1970-10-01), Woods
patent: 3669891 (1972-06-01), Greenwood et al.
patent: 3749672 (1973-07-01), Golton et al.
patent: 3749672 (1973-07-01), Springfield et al.
patent: 4618402 (1986-10-01), Camus
patent: 4654043 (1987-03-01), Streit et al.
patent: 4898672 (1990-02-01), Burton
patent: 4995984 (1991-02-01), Barkatt
patent: 5250402 (1993-10-01), Okada et al.

Affiliated with

Also associated with

Rating

Stabilized hypohalite compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Stabilized hypohalite compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stabilized hypohalite compositions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-849082