Drug – bio-affecting and body treating compositions – Designated organic active ingredient containing – Nitrogen containing other than solely as a nitrogen in an...
Patent
1998-09-21
2000-10-31
Jones, Dwayne C.
Drug, bio-affecting and body treating compositions
Designated organic active ingredient containing
Nitrogen containing other than solely as a nitrogen in an...
514625, 514627, 564305, A01N 3718, A61K 31165
Patent
active
061403709
ABSTRACT:
This invention pertains to the protection of nonaqueous compositions containing a transition metal from microbial spoilage using a stabilized antimicrobial composition comprising a halopropynyl compound and an organic epoxide.
REFERENCES:
patent: 3660499 (1972-05-01), Kobayashi et al.
patent: 3923870 (1975-12-01), Singer
patent: 4018661 (1977-04-01), Cramer et al.
patent: 4259350 (1981-03-01), Morisawa et al.
patent: 4276211 (1981-06-01), Singer et al.
patent: 4297258 (1981-10-01), Long, Jr.
patent: 4323602 (1982-04-01), Parker
patent: 4592773 (1986-06-01), Tanaka et al.
patent: 4616004 (1986-10-01), Edwards
patent: 4639460 (1987-01-01), Rose
patent: 4719227 (1988-01-01), Shade et al.
patent: 4915909 (1990-04-01), Song
patent: 4945109 (1990-07-01), Rayudu
patent: 4977186 (1990-12-01), Gruening
patent: 5071479 (1991-12-01), Gruening
patent: 5082722 (1992-01-01), Gugliemo, Sr.
patent: 5127934 (1992-07-01), Mattox
patent: 5190580 (1993-03-01), Gruening
patent: 5209930 (1993-05-01), Bowers-Daines et al.
patent: 5554784 (1996-09-01), Gruening
Gaglani Kamlesh D.
Yang Meihua
Jones Dwayne C.
Tavares Robert F.
Troy Technology Corporation Inc.
LandOfFree
Stabilized alkyd based compositions containing halopropynl compo does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Stabilized alkyd based compositions containing halopropynl compo, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stabilized alkyd based compositions containing halopropynl compo will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2052317