Stabilization of slurry used in chemical mechanical polishing of

Details Stabilization of slurry used in chemical mechanical polishing of Stabilization of slurry used in chemical mechanical polishing of

1999-06-03

2000-04-25

Banks, Derris Holt

Abrading

Abrading process

Abradant supplying

451 28, 451910, B24B 719, B24B 730

Patent

active

060538023

ABSTRACT:
A method and apparatus for conditioning a slurry used in a chemical mechanical polishing apparatus is disclosed. Megasonic generators are provided along the piping network between a slurry reservoir and the CMP apparatus. A megasonic generator may also be placed adjacent to the slurry reservoir. The megasonic generators discourage the formation of agglomerate particles, which in turn reduces the number of defects caused by the large particles in the slurry.

REFERENCES:
patent: 5201305 (1993-04-01), Takeuchi
patent: 5746646 (1998-05-01), Shibano

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