Compositions – Oxidative bleachant – oxidant containing – or generative – Composition containing a stabilizer or a product in the form...
Patent
1986-08-25
1988-09-13
Terapane, John F.
Compositions
Oxidative bleachant, oxidant containing, or generative
Composition containing a stabilizer or a product in the form...
25218628, 134 3, 423272, 423273, C01B 15037, C23G 102
Patent
active
047708085
ABSTRACT:
Unless aqueous acidic hydrogen peroxide solutions are stabilized, an excessive rate of decomposition of hydrogen peroxide precludes their use for treatment of metal surfaces, such as of copper and copper alloys, during which use substantial concentrations of decomposition catalysts build-up in solution. Regular monitoring of the solutions for residual stabilizer content would demand sophisticated analytical equipment beyond the reach of many users.
The invention provides a stabilizer in the form of a block of sparingly soluble material, whereby monitoring can be simply and readily effected visually or by a simple electrical or mechanical detection system. For copper/copper alloys preferred stabilizers are p-hydroxybenzoic acid and triphenyl carbinol.
REFERENCES:
patent: 3480557 (1969-11-01), Shiraeff
patent: 3537895 (1970-11-01), Lancy
patent: 3556883 (1971-01-01), Naito et al.
patent: 3649194 (1972-03-01), Glanville
patent: 3756957 (1973-09-01), Shiga
patent: 3801512 (1974-04-01), Solenberger
patent: 3869401 (1975-03-01), Ernst
patent: 4059678 (1977-11-01), Winkley
patent: 4636368 (1987-01-01), Pralus
McDonogh Colin F.
Mobbs David B.
Caress Virginia B.
Interox Chemicals Limited
Terapane John F.
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