Stabilization of a patterned planarizing layer for solid state i

Details Stabilization of a patterned planarizing layer for solid state i Stabilization of a patterned planarizing layer for solid state i

1992-03-24

1997-08-05

Fourson, George

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

438 80, H01L 2170

Patent

active

056542020

ABSTRACT:
A solid state image sensor is described which includes a planarizing layer incorporated into a means of color separation. The planarizing layer has been found to provide a smooth, uniform surface for coating and adhesion of a color separator within the active device area. The planarizing layer remains on the completed device and is patterned to permit access to bonding pads. Negative photoresist materials, photoinitiated polymerization imaging systems and positive imaging systems may be selected for use as the planarizing layer.

REFERENCES:
patent: 2548564 (1951-04-01), Sprague et al.
patent: 2548575 (1951-04-01), Weyerts
patent: 2675316 (1954-04-01), Carroll et al.
patent: 2713305 (1955-07-01), Yutzy et al.
patent: 2756149 (1956-07-01), Saunders et al.
patent: 2768078 (1956-10-01), Reynolds et al.
patent: 3448706 (1969-06-01), Chisholm et al.
patent: 3557066 (1971-01-01), Cohen et al.
patent: 3625694 (1971-12-01), Cohen et al.
patent: 3706690 (1972-12-01), Duve et al.
patent: 3758445 (1973-09-01), Cohen et al.
patent: 3778885 (1973-12-01), Stoll
patent: 3898088 (1975-08-01), Cohen et al.
patent: 3944424 (1976-03-01), Cohen et al.
patent: 4966831 (1990-10-01), Mehra et al.
patent: 5028547 (1991-07-01), Iizuka et al.
patent: 5132251 (1992-07-01), Kim et al.
patent: 5143855 (1992-09-01), Pace et al.
"Photoreactive Polymers: The Science and Technology of Resists", Arnost Reiser, John Wiley and Sons, Inc., N.Y. 1989, title page.
Kosar, "Light Sensitive Systems", pp. 323-324, John Wiley and Sons, N.Y., N.Y. (date unknown).
"Continuous Tone Dyed Diazo Imaging Elements," Research Disclosure, vol. 169, Item 16976, May 1978.

Affiliated with

Also associated with

Rating

Stabilization of a patterned planarizing layer for solid state i does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Stabilization of a patterned planarizing layer for solid state i, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stabilization of a patterned planarizing layer for solid state i will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1074382