Stability enhanced rare-gas monofluoride lasers

Details Stability enhanced rare-gas monofluoride lasers Stability enhanced rare-gas monofluoride lasers

1980-06-05

1982-09-07

Davie, James W.

Coherent light generators

Particular pumping means

Pumping with optical or radiant energy

372 57, H01S 322, H01S 397

Patent

active

043486479

ABSTRACT:
The onset of electric discharge instability in rare-gas monofluoride lasers pumped by electron beam sustained electric discharges (e.g., KrF*) is delayed by employing a laser gas mixture (such as 0.95 Ar, 0.05 Kr, and 0.005 F.sub.2) which includes a small amount of a halogen compound (NF.sub.3) having a rate coefficient for electron dissociative attachment which is much larger than that for fluorine (such as 0.0005 NF.sub.3). The addition of nitrogen trifluoride to the gas mixture modifies the halogen kinetics in a manner to reduce the effect that consumption of the fluorine fuel has on the growth of secondary electrons, and therefore the occurrence of instability in the discharge. The rare-gas metastable quenching coefficient for the nitrogen trifluoride is sufficiently small (on the order of six times smaller than that of the fluorine) so that the small amount of nitrogen trifluoride utilized to stabilize the discharge exerts little or no influence on the other laser processes.

REFERENCES:
patent: 4238742 (1980-12-01), Champagne
Brown et al., "Instability Onset in Electron-Beam-Sustained KrF* Laser Discharges", App. Phys. Lett. 32 (11), Jun. 1, 1978, pp. 730-733.
Nighan, "Plasma Processes in Electron-Beam Controlled Rare-Gas Halide Lasers", IEEE J. of Quantum Electronics, vol. QE-14, No. 10, Oct. 1978, pp. 714-726.

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