SRAM cell and method for fabricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...

Reexamination Certificate

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C257S903000, C257S904000, C438S149000, C438S151000, C438S157000, C438S166000

Reexamination Certificate

active

06864506

ABSTRACT:
SRAM cell and method for fabricating the same, the SRAM cell including a first local interconnection connected between first terminals of the first access transistor, the first load transistor, and the first drive transistor, and gates of the second load transistor, and the second drive transistor electrically, and a second local interconnection connected between first terminals of the second access transistor, the second load transistor, and the second drive transistor, and gates of the first load transistor, and the first drive transistor electrically, thereby reducing an area of the SRAM cell.

REFERENCES:
patent: 5712509 (1998-01-01), Harada et al.
patent: 6229186 (2001-05-01), Ishida
patent: 6236117 (2001-05-01), Ishigaki et al.
Perera, Asanga H., et al. IEEE. vol. 23, No. 4, pp. 571-574, 2000.
Sun, S. W. IEEE. pp. 52-55, 1998.
Young, K. K. vol. 23, No. 2, pp. 563-566, 2000.

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