Sputtering technique for the deposition of indium oxide

Details Sputtering technique for the deposition of indium oxide Sputtering technique for the deposition of indium oxide

1977-09-26

1978-09-12

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192C, C23C 1500

Patent

active

041135997

ABSTRACT:
Consistent properties for indium oxide films deposited by cathode sputtering over a wide range of outgassing conditions are obtained by adjusting the flow rate of oxygen to maintain a constant discharge current while adjusting the flow rate of argon to maintain a constant pressure in the sputtering chamber.

REFERENCES:
patent: 3907660 (1975-09-01), Gillery
patent: 4043889 (1977-08-01), Kochel
"Physics of Thin Films," G. Hass et al., editors, Academic Press, 1977, vol. 9, pp. 49-71.

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