Specialized metallurgical processes – compositions for use therei – Compositions – Consolidated metal powder compositions
Patent
1980-01-31
1982-05-25
Hunt, Brooks H.
Specialized metallurgical processes, compositions for use therei
Compositions
Consolidated metal powder compositions
75225, 75248, B22F 312
Patent
active
043314767
ABSTRACT:
Metallic sputtering targets having minimal mobile ion contamination are produced by forming a compacted slab of particles of the constituent metal(s) in an isostatic pressing operation. The slab is then transferred to a heat resistant support faced with a material, such as alumina, that is inert at high temperatures. Next, the supported slab is placed in a vacuum oven and heated to a temperature sufficient to bond the metal particles together and volatilize mobile ion contaminants. The sintered slab is usable as a cathodic sputtering target with minimal additional treatment. The level of mobile ion contaminants in the completed target may be monitored by fabricating an MOS capacitor using the target, plotting its capacitance versus applied voltage over a suitable range, then measuring the extent to which the plot shifts after a high temperature-positive bias stress treatment.
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patent: 3700434 (1972-10-01), Abkowitz
patent: 3793014 (1974-02-01), Rosenwasser
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Helderman Earl R.
Zimmerman Robert R.
Hunt Brooks H.
Tektronix Inc.
Winkelman John D.
Zimmerman J. J.
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