Sputtering targets having life alarm function

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Details

20419213, 20429803, C23C 1434, C23C 1452

Patent

active

054878233

ABSTRACT:
A sputtering target is provided in which a gas component source (material capable of evolving gas) is included in the bottom portion of the target. Predicting and determining the expiration of the useful life of sputtering targets is permitted more precisely and in a simpler way than heretofore described. Moreover over-sputtering is prevented with an improvement in target use efficiency.

REFERENCES:
patent: 4345968 (1982-08-01), Coe
patent: 4374722 (1983-02-01), Zega
patent: 4545882 (1985-10-01), McKelvey
patent: 5380419 (1995-01-01), Eggers et al.

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