Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1994-04-26
1996-01-30
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419213, 20429803, C23C 1434, C23C 1452
Patent
active
054878233
ABSTRACT:
A sputtering target is provided in which a gas component source (material capable of evolving gas) is included in the bottom portion of the target. Predicting and determining the expiration of the useful life of sputtering targets is permitted more precisely and in a simpler way than heretofore described. Moreover over-sputtering is prevented with an improvement in target use efficiency.
REFERENCES:
patent: 4345968 (1982-08-01), Coe
patent: 4374722 (1983-02-01), Zega
patent: 4545882 (1985-10-01), McKelvey
patent: 5380419 (1995-01-01), Eggers et al.
Anan Junichi
Nakamura Hiroki
Sakaya Yoshihiro
Sawada Susumu
Japan Energy Corporation
Weisstuch Aaron
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