Sputtering targets for magneto-optic films and a method for maki

Details Sputtering targets for magneto-optic films and a method for maki Sputtering targets for magneto-optic films and a method for maki

1988-01-11

1989-04-25

Lechert, Jr., Stephen J.

Specialized metallurgical processes, compositions for use therei

Compositions

Consolidated metal powder compositions

204292, 419 23, 419 31, 419 33, 419 48, 419 57, 419 60, B22F 100

Patent

active

048244813

ABSTRACT:
Sputtering targets are made by melting at least one rare earth and at least one transition metal to produce an amorphous alloy melt, forming a powder of the alloy in an oxygen free atmosphere, introducing the powdered alloy into a reducing mold, adding a layer of powdered oxygen-getter on top of the powdered alloy, and hot pressing the alloy.

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Jayaraman et al, "Microstructures in Rapidly Solidified Ni-Mo Alloy", ASM, 1985.
Vossen, J. L., "J. Vac. Sci. Technol.", vol. 8, No. 6, 751-751 (1971).

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