Sputtering target with ultra-fine, oriented grains and method of

Powder metallurgy processes – Forming articles by uniting randomly associated metal particles

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75232, 75249, 75340, 419 66, 420529, 420537, 420538, 420548, 420550, 420551, 420552, C22C 104, C22C 2100, B22F 302, B22F 500

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058093931

ABSTRACT:
A sputtering target comprising a body of metal such as aluminum and its alloy with an ultrafine grain size and small second phase. Also described is a method for making an ultra-fine grain sputtering target comprising melting, atomizing, and depositing atomized metal to form a workpiece, and fabricating the workpiece to form a sputtering target. A method is also disclosed that includes the steps of extruding a workpiece through a die having contiguous, transverse inlet and outlet channels of substantially identical cross section, and fabricating the extruded article into a sputtering target. The extrusion may be performed several times, producing grain size of still smaller size and controlled grain texture.

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