Sputtering target with machine readable indicia

Details Sputtering target with machine readable indicia Sputtering target with machine readable indicia

1993-12-10

1995-09-12

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429813, 20429809, C23C 1434

Patent

active

054494451

ABSTRACT:
An expendable target of sputter coating material is provided having secured thereto a storage medium having recorded thereon, in machine readable indicia, information relating to a characteristic of the target. The information preferably includes target identifying information and may also include information relating to the target composition, the history of the use of the target, and other information usable by the apparatus to automatically set machine parameters or to record process information. Information, particularly of the use of the target, may be updated and written to a medium on the target or target assembly, or to a machine readable medium which may be affixed to the target assembly when the target is removed. The target is preferably one piece with a cooling surface opposite its sputtering surface, and having the indicia fixed to the sputtering material at the periphery or rim of the target.

REFERENCES:
patent: 4166783 (1979-09-01), Turner
patent: 4508612 (1985-04-01), Blackwell et al.
patent: 4756814 (1988-07-01), van Voren et al.
patent: 4902398 (1990-02-01), Homstad
patent: 4957605 (1990-09-01), Hurwitt et al.
patent: 5009765 (1991-04-01), Qamar et al.
patent: 5126028 (1992-06-01), Hurwitt et al.
patent: 5130005 (1992-07-01), Hurwitt et al.
patent: 5284561 (1994-02-01), Shinneman

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