Sputtering target used for forming quinary superconductive oxide

Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k

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75234, 20419224, 20429813, 419 19, 505731, H01L 3912

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050772694

ABSTRACT:
A target used for forming a thin film of a quinary superconductive oxide contains metal copper ranging between about 8% and about 40% by volume dispersed into a quaternary or a quinary complex oxide, and the metal copper improves the thermal conductivity and the electrical conductivity of the target, so that cracks are less liable to take place in the target and the target is applicable to a d.c. sputtering system, thereby decreasing the production cost of the thin film.

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