Sputtering target transport box

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Reexamination Certificate

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Details

C220S001600, C206S523000, C206S709000, C206S716000, C206S722000, C206S724000

Reexamination Certificate

active

07871505

ABSTRACT:
The present invention pertains to a sputtering target transport box having a void the size of a sputtering target, wherein supports for mechanical transport are provided to the bottom plate of the transport box, and a wheel for man-powered transport is provided to the edge portion of the bottom plate. Provided thereby is a sputtering target transport box in which the removal and transport of a sputtering target is easy, and which enables the transport of a sputtering target without causing any damage thereto.

REFERENCES:
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patent: 5378428 (1995-01-01), Inoue et al.
patent: 5577616 (1996-11-01), Liang
patent: 5582114 (1996-12-01), Feiner
patent: 5638979 (1997-06-01), Shea
patent: D382111 (1997-08-01), Bardus et al.
patent: 5669233 (1997-09-01), Cook et al.
patent: 5830545 (1998-11-01), Frisk
patent: 7059475 (2006-06-01), Zabka et al.
patent: 59-728 (1984-01-01), None
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patent: 01290765 (1989-11-01), None
patent: 4-84138 (1992-07-01), None
patent: 6-18228 (1994-03-01), None
patent: 11-011478 (1999-01-01), None
patent: 11350122 (1999-12-01), None
patent: 2000-079942 (2000-03-01), None
Japanese machine translation of the specification of JP 11011478 [Accessed on Mar. 3, 2008].
Patent Abstracts of Japan, 1 page English Abstract of JP 11-011478, Jan. 1999.
Patent Abstracts of Japan, 1 page English Abstract of JP 2000-079942, Mar. 2000.

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