Compositions – Electrically conductive or emissive compositions – Metal compound containing
Reexamination Certificate
2004-02-03
2009-12-22
McGinty, Douglas (Department: 1796)
Compositions
Electrically conductive or emissive compositions
Metal compound containing
C252S519500, C252S518100, C252S519100
Reexamination Certificate
active
07635440
ABSTRACT:
Provided is a sputtering target having a relative density of 80% or more and containing a compound having as its principal component zinc oxide satisfying AXBYO(KaX+KbY)/2(ZnO)m, 1<m, X≦m, 0<Y≦0.9, X+Y=2, where A and B are respectively different positive elements of trivalence or more, and the valencies thereof are respectively Ka and Kb. Obtained is a ZnO based sputtering target which does not contain ZnS and SiO2, and, upon forming a film via sputtering, is capable of reducing the affect of heating the substrate, of performing high speed deposition, of adjusting the film thickness to be thin, of reducing the generation of particles (dust) and nodules during sputtering, of improving the productivity with small variation in quality, and which has fine crystal grains and a high density of 80% or more, particularly 90% or more.
REFERENCES:
patent: 5843341 (1998-12-01), Orita et al.
patent: 5972527 (1999-10-01), Kaijou et al.
patent: 6042752 (2000-03-01), Mitsui
patent: 6528442 (2003-03-01), Kuwano et al.
patent: 6998070 (2006-02-01), Inoue et al.
patent: 7061014 (2006-06-01), Hosono et al.
patent: 7279211 (2007-10-01), Yahagi et al.
patent: 7306861 (2007-12-01), Inoue et al.
patent: 7393600 (2008-07-01), Inoue et al.
patent: 2001/0040733 (2001-11-01), Toyoshima et al.
patent: 2005/0084799 (2005-04-01), Yahagi et al.
patent: 2005/0115829 (2005-06-01), Yahagi et al.
patent: 11-158607 (1999-06-01), None
patent: 11-256321 (1999-09-01), None
patent: 2000044236 (2000-02-01), None
patent: 2000-195101 (2000-07-01), None
patent: 2000-256061 (2000-09-01), None
patent: 2002-226267 (2002-08-01), None
Minami et al., “New Transparent Conducting ZnO-In2O3-SnO2Thin Films Prepared by Magnetron Sputtering”, Thin Solid Films, vol. 317, pp. 318-321, 1998, month unknown.
Esp@cenet, One Page English Abstract of JP 2000-026119, Jan. 2000.
Esp@cenet, One Page English Abstract of JP 2000-044236, Feb. 2000.
Hosono Hideo
Takami Hideo
Ueda Kazushige
Yahagi Masataka
Howson & Howson LLP
McGinty Douglas
Nippon Mining & Metals Co., Ltd.
LandOfFree
Sputtering target, thin film for optical information... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Sputtering target, thin film for optical information..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sputtering target, thin film for optical information... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4080915