Sputtering target for magnetic recording medium and method of pr

Details Sputtering target for magnetic recording medium and method of pr Sputtering target for magnetic recording medium and method of pr

1993-07-30

1994-08-02

Yee, Deborah

Metal treatment

Stock

Cobalt base

420436, 148674, 72700, C22C 1907

Patent

active

053342674

ABSTRACT:
A sputtering target preferably having an average crystal-grain diameter of 300 .mu.m or less and a maximum magnetic permeability of 100 or less is formed of an alloy consisting essentially of, by atom, 5- 30% Ni, 5- 14% Cr, not more than 6% V, and balance of Co and unavoidable impurities. It is preferable for the target to keep a working-strain remaining therein to reduce the maximum magnetic permeability. A method of producing a sputtering target for magnetic recording and reproducing, in which warm working or cold working is applied to the alloy.

REFERENCES:
"Digests of the Twelfth Annual Conference on Magnetics", p. 23, Effects of Substituted Elements into the Magnetic Layer on CoNiCr/Cr Sputtered Hard Disk, M. Ishikawa, et al.

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